EUV damage threshold measurements of Mo/Si multilayer mirrors

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EUV damage threshold measurements of Mo/Si multilayer mirrors

We present 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. The experiments were performed on different types of Mo/Si mirror, showing no significant difference in single pulse damage thresholds. However, the damage threshold for ten pulses is ≈...

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Mechanisms of radiation damage to Sc/Si multilayer mirrors under EUV laser irradiation

Specific structural changes in Sc/Si multilayer mirrors irradiated with extreme ultraviolet (EUV) laser single pulses (λ = 46.9 nm) at near damage threshold fluences (0.04–0.23 J cm−2) are analysed. We have identified melting of surface layers as the basic degradation mechanism for the mirrors. Both heat generation during silicide formation and low heat conduction of the layered system signific...

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Properties of broadband depth-graded multilayer mirrors for EUV optical systems.

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ژورنال

عنوان ژورنال: Applied Physics A

سال: 2012

ISSN: 0947-8396,1432-0630

DOI: 10.1007/s00339-012-7037-9